Bowtie aperture has been widely applied in the realm of nanometer direct-writing lithography for obtaining focusing spots beyond the diffraction limit. However, the obtained spot is elliptic-shape for the Bowtie case, which impacts the applications of the Bowtie structure. Double Bowtie aperture, as a novel nano-lithography structure, is proposed to attain circle-symmetric focusing spots beyond diffraction limit. The results demonstrate that cir-cle-symmetry spots can be obtained, and the electric field intensity of transmission light is 22 times of that of inci-dence. By combining the double Bowtie structure with metal-insulator-metal, the propagation length of the enhanced transmission light is obviously prolonged.
The investigation of focusing characteristic based on double Bowtie nano-lithography structure
First published at:Feb 15, 2017
Opto-Electronic Engineering Vol. 44, Issue 02, pp. 216 - 220 (2017) DOI:10.3969/j.issn.1003-501X.2017.02.011
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Get Citation: Zheng Jie, Liu Xianchao, Liu Yuerong, et al. The investigation of focusing characteristic based on double Bowtie nano-lithography structure[J]. Opto-Electronic Engineering, 2017, 44(2): 216–220.