Recently, the Optical Society of America (OSA) announced the list of 2019 OSA Fellow Members. There are 98 scientists around the world on the list.

    OSA members who have achieved outstanding results in optics and photonics can be selected as members of the American Optical Society (OSA Fellow). According to the OSA regulations, the number of members of the club does not exceed 10% of the total number of OSA members, and the number of members selected each year is only about 0.5% of the current total membership.

    There are 12 Chinese scientists selected as the OSA Fellow, including Prof. Xiangang Luo, the Editor-in-Chief of Opto-Electronic Engineering and Opto-Electronic Advances, and Prof. Yan Zhang, an editor of Opto-Electronic Engineering.


Congratulations 2019 OSA Fellows:


Name Institution Country or Region
Lan Jiang Beijing Institute of Technology China
Xiangang Luo Institute of Optics and Electronics, Chinese Academy of Sciences China
Yi Luo Tsinghua University China
Yidong Huang Tsinghua University  
Cheng-Zhi Peng University of Science and Technology of China China
Yun-Feng Xiao Peking University China
Yan Zhang Capital Normal University China
Weiping Zhang Shanghai Jiao Tong University China
Lei Zhou Fudan University China
Shengwang Du Hong University of Science and Technology Hong Kong,China
Kei May Lau Hong Kong University of Science and Technology Hong Kong,China
Sheng-Lung Huang National Taiwan University Taiwan,China
Judith Dawes Macquarie University Australia
Steve Frisken Cylite and Finisar Australia Australia
Christina Lim University of Melbourne Australia
Richard Mildren Macquarie University Australia
Geoff Pryde Griffith University Australia
Pierre Berini University of Ottawa Canada
Amr S. Helmy University of Toronto Canada
Ebrahim Karimi University of Ottawa Canada
Hoi-Kwong Lo University of Toronto Canada
Lorne Whitehead University of British Columbia Canada
Anders Kristensen Danmarks Tekniske Universitet Denmark
Leif Oxenløwe DTU Fotonik Denmark
Mircea Guina Tampere University of Technology Finland
Saša Bajt Deutsches Elektronen-Synchrotron (DESY) Germany
Karsten Buse Fraunhofer Institute for Physical Measurement Techniques IPM and University of Freiburg Germany
Ronald Holzworth Menlo Systems GmbH Germany
Rupert Huber University of Regensburg Germany
Uli Lemmer Karlsruhe Institute of Technology Germany
Uwe Morgner Leibniz Universität Hannover Germany
Nathalie Picqué Max-Planck Institute of Quantum Optics Germany
Christine Silberhorn Universität Paderborn Germany
Adrian Stern Ben Gurion University of the Negev Israel
Maruo Nisoli Politecnico di Milano Italy
Roberto Osellame CNR– Istituto di Fotonica e Nanotecnologie Italy
Francesco Saverio Pavone University of Florence Italy
Pierluigi Poggiolini Politecnico di Torino Italy
Concita Sibilia Department of Basic and Applied Science, Università degli Studi di Roma La Sapienza Italy
Kiichi Hamamoto Kyushu University Japan
Osamu Matoba Kobe University Japan
Taiichi Otsuji Tohoku University Japan
Ion N. Mihailescu National Institute for Laser, Plasma and Radiation Physics Romania
Jr-Hau He King Abdullah University of Science and Technology (KAUST) Saudi Arabia
Cesare Soci Nanyang Technological University Singapore
Yoonchan Jeong Seoul National University South Korea
Sergei Popov Department of Applied Physics,School of Engineering Sciences, Royal Institute of Technology (KTH) Sweden
Lukas Gallman ETH Zurich Switzerland
Ekmel Ozbay Bilkent Universitesi Turkey
Daniele Faccio University of Glasgow United Kingdom
Animesh Jha Faculty of Engineering, University of Leeds United Kingdom
Kenny Weir Imperial College London United Kingdom
Geoffrey K. Aguirre University of Pennsylvania USA
Eugene G. Arthurs   USA
Martin S. Banks University of California, Berkeley USA
Jiming Bao University of Houston USA
Alexey Belyanin Texas A&M University USA
Paul Campagnola University of Wisconsin-Madison USA
Ji-Xin Cheng Boston University USA
Richard N. Claytor Fresnel Technologies Inc. USA
Nadir Dagli University of California, Berkeley USA
Jay W. Dawson Lawrence Livermore National Laboratory USA
Hui Deng University of Michigan, Ann Arbor USA
Liang Feng University of Pennsylvania USA
Peter Fritschel Massachusetts Institute of Technology USA
Yun Fu Northeastern University USA
Enrique J. Galvez Colgate University USA
Tayyaba Hasan Wellman Center for Photomedicine, Massachusetts General Hospital, Harvard Medical School USA
Markus Hehlen Los Alamos National Laboratory USA
Roger Helkey University of California,Santa Barbara USA
Hong Hua University of Arizona USA
Richard A. Hutchin Optical Physics Company USA
M. Saif Islam University of California,Davis USA
Mackillo Kira University of Michigan USA
Zhongping Lee University of Massachusetts Boston USA
Qiang Lin University of Rochester USA
Wenhua Lin Intel Corporation USA
Marjatta Lyyra Temple University USA
Anne Matsuura Intel Corporation USA
Richard Mirin National Institute of Standards and Technology USA
Amy S. Mullin University of Maryland at College Park USA
Ellen Ochoa NASA (retired) USA
Teri W. Odom Northwestern University USA
Kannan Raj Oracle USA
David A. Reis Stanford University and SLAC National Accelerator Laboratory USA
Kent Rochford SPIE USA
Axel Schülzgen University of Central Florida USA
Shyh-Chiang Shen Georgia Institute of Technology USA
Daniel Sigg LIGO Hanford Observatory USA
Tayyab Suratwala Lawrence Livermore National Laboratory USA
Guillermo J. Tearney MD,PhD, Wellman Center for Photomedicine and Department of Pathology, Massachusetts General Hospital USA
Laura Waller University of California, Berkeley USA
Sean Wang B&W Tek Inc. USA
Daniel Wasserman University of Texas at Austin USA
Edward A. Whittaker Stevens Institute of Technology USA
Ming C. Wu University of California, Berkeley USA
Martin Zanni University of Wisconsin-Madison USA
Song Zhang Purdue University USA