Displacement measurement analysis in distortion detection of lithography projection objective

Du Jing; Liu Junbo; Quan Haiyang; Hu Song

doi:10.12086/oee.2023.220226

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Du J, Liu J B, Quan H Y, et al. Displacement measurement analysis in distortion detection of lithography projection objective[J]. Opto-Electron Eng, 2023, 50(2): 220226. doi: 10.12086/oee.2023.220226

Citation:

Du J, Liu J B, Quan H Y, et al. Displacement measurement analysis in distortion detection of lithography projection objective[J]. Opto-Electron Eng, 2023, 50(2): 220226. doi: 10.12086/oee.2023.220226

Displacement measurement analysis in distortion detection of lithography projection objective

State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China

Fund Project: National Key Research and Development Plan (2021YFB3200204), and the Youth Innovation Promotion Association of the Chinese Academy of Sciences (2021380)

More Information

Corresponding author: husong@ioe.ac.cn

Received Date 15 September 2022

Revised Date 26 October 2022

Accepted Date 11 November 2022

Available Online 16 February 2023

Published Date 25 February 2023

Abstract

Abstract

In the distortion detection of the lithography projection objective, the displacement measurement error is one of the important error sources. Depth analysis of the error sources and reduction of the error terms can improve the distortion detection accuracy. Combining the positioning and measurement technology of the moving stage, this paper analyzes the displacement measurement error of the image quality detection stage when the Shack-Hartmann wavefront sensor is used to detect the distortion of the projection objective. In this paper, a set of image quality detection platform is taken as an example to analyze the displacement measurement error in the distortion detection of the projection objective, and the image quality detection platform is used to measure the distortion of a projection objective. The distortion detection result is about 80 nm, in which the displacement measurement error of the image quality detection platform will bring about an uncertainty of about 22 nm to the distortion detection result.
- distortion measurement /
- wavefront measurement /
- displacement measurement /
- projection objective

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References

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