A review on the fabrication technology of X-ray reflector

Li Ming; Wu Jieli; Wu Yongqian; Xu Yan; Zhang Dongni; Hong Zhen; Yang Fugui; Wan Yongjian

doi:10.12086/oee.2020.200205

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Li M, Wu J L, Wu Y Q, et al. A review on the fabrication technology of X-ray reflector[J]. Opto-Electron Eng, 2020, 47(8): 200205. doi: 10.12086/oee.2020.200205

Citation:

Li M, Wu J L, Wu Y Q, et al. A review on the fabrication technology of X-ray reflector[J]. Opto-Electron Eng, 2020, 47(8): 200205. doi: 10.12086/oee.2020.200205

A review on the fabrication technology of X-ray reflector

1.
Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China
2.
University of Chinese Academy of Sciences, Beijing 100049, China
3.
Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China

More Information

^*Corresponding author: Wan Yongjian, E-mail:yjwan@ioe.ac.cn

Received Date 03 June 2020

Revised Date 10 August 2020

Published Date 01 August 2020

Abstract

Abstract

This article reviews on the fabrication advancement of X-ray reflect mirror fabrication in terms of technical requirements, fabrication and metrology development. Synchrotron radiation source, as a revolutionary light source, provides one of the most high-performance X-ray for scientific research, where reflect mirror plays an essential role in X-ray beam focusing. The short wavelength of X-ray demands reflecting photons only at a grazing angle of incidence on the extremely high-precision and smooth surface. Fabrication of such mirrors requires highly specialized equipment and technology that only a few foreign optic manufacturers possess, whereas manufacturers in China is laggard in this area. It is imperative to develop fabrication capability domestically as two synchrotron radiation facilities are under construction and several more projects are about to launch in the near future in China.
- X-ray focusing /
- synchrotron radiation light source /
- short wavelength /
- reflector

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References

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Overview

Overview

Overview: This article reviews on the fabrication technology of X-ray reflect mirror. Synchrotron radiation source, as a revolutionary light source, provides one of the most high-performance X-ray for scientific research, where reflect mirror plays an essential role in X-ray beam focusing. The short wavelength of X-ray requires reflecting photons only at a grazing angle of incidence on the extremely high-precision and smooth surface. Theoretically, a reflector only with the surface error no more than 1 nm (RMS) and slope error better than 50 nrad can meet the 4^th generation synchrotron facility criterion, which is equivalent to controlling the surface height variance to as low as several-silicon-atom layers over hundreds-of-millimeter length. Relationship of the surface accuracy at each spatial frequency and mirror performance is explained in the article. These extreme demands make fabrication of such mirror depends highly upon specialized equipment and technology concerning both fabrication and metrology. Fabrication route can be sorted into two approaches. One is ion-beam-figuring-centered fabrication which realizes a slope error of 0.1 μrad~0.3 μrad (RMS) and roughness less than 0.3 nm (RMS) by means of IBF combined with ripple reduction and roughness improvement procedures, the latter of which are mainly deployed to ease the mid- and high-spatial-frequency surface errors brought by small tools polishing tracks. The other route is the elastic emission machining (EEM) method, which, along with plasma chemical vaporization machining (PVCM), is capable of producing state of the art X-ray focusing mirror over 1 m length with surface height error as low as 1 nm (P-V) and roughness lower than 0.1 nm (RMS). Surface height error at mid- and high- frequencies are diminished through gradual increase of polishing resolution. Surface metrology accuracy directly determines the limit of fabrication quality. Long trace profiler (LTP), a one dimensional figure measuring method, can perform extremely precise measurement especially on flat mirrors. It is essential and commonly used at light sources for mirror adjustment before mirrors being put in a beamline. Research on improving accuracy of LTP has been a shared effort of Metrology Labs at light sources. Ultrahigh-accuracy stitching interferometry is capable of providing two-dimensional surface map with higher lateral resolution, and is irreplaceable at fabrication sites for deterministic polishing process. To improve the stitching accuracy, means to determine geometric relationship of neighboring data has been developed, such as micro-stitching interferometry (MSI) and relative angle determinable stitching interferometry (RADSI) which is proven to give good performance. China is still at the early stage in this area which can hardly meet the need of the two under-construction synchrotron radiation facilities (HEPS and SHINE) and let alone several more projects about to launch in the near future in China. It is imperative to develop fabrication technique and capability domestically.