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The research progress of surface interferometric measurement with higher accuracy
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Abstract
With the continuous development of modern optics, such as EUV, DUV lithography and the advanced light source, the surface interferometric measurement with higher accuracy has become an important challenge. The surface accuracy as one of key technical parameters will be required to nanometer, sub-nanometer, even picometer. The surface interferometric measurement with higher accuracy push the limits of surface metrology, has important research significance and application value. This paper analyzes the development trends of surface interferometric measurement with higher accuracy and reports the related research progress of Institute of Optics and Electronics, Chinese Academy of Sciences. -
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References
[1] Dörband B, Seitz G. Interferometric testing of optical surfaces at its current limit[J]. Optik, 2001, 112(9): 392–398. doi: 10.1078/0030-4026-00081 [2] Featured News from SPIE[EB/OL]. https://www.spie.org/news/taking-optical-precision-to-the-extreme?SSO=1. [3] He Y W, Hou X, Wu Y Q, et al. Modeling Fizeau interferometer based on ray tracing with Zemax[J]. Proceedings of SPIE, 2015, 9677: 96770G. [4] Gu W, Song W H, Wu G F, et al. Model-based multi-fringe interferometry using Zernike polynomials[J]. Optics and Lasers in Engineering, 2018, 105: 198–200. doi: 10.1016/j.optlaseng.2018.01.020 [5] He Y W, Hou X, Quan H Y, et al. Retrace error reconstruction based on point characteristic function[J]. Optics Express, 2015, 23(22): 28216–28223. doi: 10.1364/OE.23.028216 [6] 王辉, 周烽, 王丽萍, 等.高精度光学元件支撑装置面形复现性分析与测量[J].中国激光, 2013, 40(12): 1208001. Wang H, Zhou F, Wang L P, et al. Analysis and metrology of reproducibility of high-precision optic mount[J]. Chinese Journal of Lasers, 2013, 40(12): 1208001. [7] 赵思伟, 田爱玲, 王大森, 等.装夹自重变形对大口径绝对面形检测的影响[J].光子学报, 2018, 47(2): 0212004. Zhao S W, Tian A L, Wang D D, et al. Influence of the clamping and gravity deformation on absolute test of large plane[J]. Acta Photonica Sinica, 2018, 47(2): 0212004. [8] Fritz B S. Absolute calibration of an optical flat[J]. Proceedings of SPIE, 1983, 433: 123–130. doi: 10.1117/12.936799 [9] Quan H Y, Hou X, Wu F, et al. Absolute measurement of optical flats based on basic iterative methods[J]. Optics Express, 2015, 23(12): 16305–16319. doi: 10.1364/OE.23.016305 [10] Song W H, Wu F, Hou X, et al. Absolute measurement of flats with the method of shift-rotation[J]. Optical Review, 2013, 20(5): 374–377. doi: 10.1007/s10043-013-0067-5 [11] Song W H, Hou X, Wu F, et al. Absolute interferometric shift-rotation method with pixel-level spatial frequency resolution[J]. Optics and Lasers in Engineering, 2014, 54: 68–72. doi: 10.1016/j.optlaseng.2013.10.015 [12] Truax B E. Absolute interferometric testing of spherical surfaces[J]. Proceedings of SPIE, 1991, 1400: 61–68. doi: 10.1117/12.26111 [13] Hou X, Yang P, Wu F, et al. Comparative experimental study on absolute measurement of spherical surface with two-sphere method[J]. Optics and Lasers in Engineering, 2011, 49(7): 833–840. doi: 10.1016/j.optlaseng.2011.03.002 [14] Song W H, Li S F, Hou X, et al. Absolute calibration for Fizeau interferometer with the global optimized shift-rotation method[J]. Optics and Lasers in Engineering, 2014, 54: 49–54. doi: 10.1016/j.optlaseng.2013.10.005 [15] Song W H, Wu F, Hou X, et al. Absolute calibration of a spherical reference surface for a Fizeau interferometer with the shift-rotation method of iterative algorithm[J]. Optical Engineering, 2013, 52(3): 033601. doi: 10.1117/1.OE.52.3.033601 [16] Song W H, Wu F, Hou X, et al. Optimized absolute testing method of shift-rotation[J]. Applied Optics, 2013, 52(28): 7028–7032. doi: 10.1364/AO.52.007028 [17] Song W H, Wu F, Hou X. Method to test rotationally asymmetric surface deviation with high accuracy[J]. Applied Optics, 2012, 51(22): 5567–5572. doi: 10.1364/AO.51.005567 [18] 宋伟红.基于平移旋转的球面绝对检测技术研究[D].北京: 中国科学院大学, 2014. Song W H. Absolute testing of spherical surface with shift-rotation method[D]. Beijing: University of Chinese Academy of Sciences, 2014. http://cpfd.cnki.com.cn/Article/CPFDTOTAL-ZGGY201109001081.htm [19] 全海洋.干涉面形绝对检测不确定度评估方法研究[D].北京: 中国科学院大学, 2017. Quan H Y. Uncertainty evaluation for interferometric testing of absolute surface figure error[D]. Beijing: University of Chinese Academy of Sciences, 2017. http://cdmd.cnki.com.cn/Article/CDMD-80151-1017820732.htm [20] Liu F W, Wang J, Wu Y Q, et al. Simultaneous extraction of phase and phase shift from two interferograms using Lissajous figure and ellipse fitting technology with Hilbert–Huang prefiltering[J]. Journal of Optics, 2016, 18(10): 105604. doi: 10.1088/2040-8978/18/10/105604 [21] He Y W, Hou X, Wu F, et al. Analysis of spurious diffraction orders of computer-generated hologram in symmetric aspheric metrology[J]. Optics Express, 2017, 25(17): 20556–20572. doi: 10.1364/OE.25.020556 [22] 何一苇.基于光线追迹和特征函数的非球面干涉检测系统建模及应用研究[D].北京: 中国科学院大学, 2018. He Y W. Research on the modeling and application of aspheric interferometry, based on ray tracing and characteristic function[D]. Beijing: University of Chinese Academy of Sciences, 2018. http://cdmd.cnki.com.cn/Article/CDMD-80151-1018828906.htm -
Overview
Overview: The demand of modern optical engineering, such as EUV, DUV lithography and the advanced light source, drives the continuous development of advanced optical manufacturing technology. Ultra precision optics, as an important branch of advanced optical manufacturing technology, is the international frontier technology direction developed in the 21st century. Measurement is one of the important means for human beings to understand and transform the material world. Ultra precision optics should be matched by the surface interferometric measurement with higher accuracy, the surface accuracy as one of key technical indexes should be less than nanometer even picometer. The surface interferometric measurement with higher accuracy push the limits of surface metrology. This paper analyzes the surface interferometric measurement with higher accuracy development trends and introduces related research progress of Institute of Optics and Electronics, Chinese Academy of Sciences. The final measurement accuracy is determined by the error factors of the surface interference detection system: The repeatability is affected by the noise in the photoelectric system of the interferometer, the error of the phase extraction algorithm and the environmental error in the optical cavity. Based on the error evaluation model, it can realize the quantitative error evaluation of each subsystem of the interferometer, and the repeatability can reach 0.05 nm RMS. For the recurrence accuracy, the mechanical stability, thermal stability and force stability of system are the major factors. By improving the mechanical and thermal stability and optimizing the design of precision support tooling, the accuracy of measurement can reach 0.1 nm RMS; the accuracy of interference is mainly limited by the accuracy of reference surface. Absolute detection technology can separate the error of reference plane through data processing of relative measurement for many times, which can realize the measurement of higher optical elements by lower reference. It is optimized for different absolute measurement techniques, we have achieved a plane measurement accuracy of 0.23 nm RMS, a sphere measurement accuracy of 0.15 nm RMS, and the accuracy of a high-order aspheric surface with a low-frequency profile deviation is 0.26 nm RMS. The key technology of ultra-high precision profile interference detection is systematically studied and innovated. Based on the international general method, the detection accuracy is cross verified, and the detection technology effectively supports the ultra-precision optical manufacturing. It lays an important technical foundation for the research and development of ultra-high performance optical system.
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Figure 1.
The demand change of surface accuracy[2]
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Figure 2.
Development of surface metrology
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Figure 3.
The influence factors of measurement accuracy of surface
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Figure 4.
The final evaluation of Interferometer repeatability.
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Figure 5.
The finite element simulation analysis of support
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Figure 6.
The experimental results of reproduction evaluation.
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Figure 7.
The comparison of surface with absolute measurement and relative measurement.
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Figure 8.
The scheme of plane absolute measurement.
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Figure 9.
The comparison results with different plane calibration methods.
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Figure 10.
The scheme of the two-sphere method
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Figure 11.
Simulation analysis system of the two-sphere method
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Figure 12.
Simulation analysis of the two-sphere methods.
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Figure 13.
The compared maps between ZYGO and multi-feature matching optimization algorithm.
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Figure 14.
The scheme of random ball test
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Figure 15.
Independent calibration results of F1.1 sphere.
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Figure 16.
The scheme of absolute test of spherical surface based on shift-rotation method
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Figure 17.
The result of shift-rotation algorithm.
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Figure 18.
The error of shift-rotation algorithm.
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Figure 19.
The flow chart of gravity flow deformation compensation based FEM
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Figure 20.
The scheme of computer generated holograms
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Figure 21.
Reconstruction map of CGH substrate.
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Figure 22.
Comparison of simulated and measured figure error induced by stay light in the first CGH system.
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Figure 23.
The map by two independent measurements.
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Figure 24.
The flow chart of uncertainty evaluation basic Quasi-MCM
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Figure 25.
The composite uncertainty matrix
