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Chen X S, Du W J, Lou Z L, et al. Label-free far-field subdiffraction imaging based on hyperbolic metamaterial[J]. Opto-Electron Eng, 2022, 49(11): 220056. doi: 10.12086/oee.2022.220056
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Label-free far-field subdiffraction imaging based on hyperbolic metamaterial
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Abstract
Super-resolution optical microscopy is an important technology due to the non-contact and non-destructive advantages. Currently, most of the super-resolution imaging methods rely on fluorescent dyes, which limited their applications. The label-free far-field microscopy imaging method based on the frequency shift effect has been proposed and developed in recent years. However, its spatial resolution is limited by the refractive index of waveguide materials. Based on the characteristic of optical spatial spectrum band-pass filtering in hyperbolic metamaterials (HMM), a large-area uniform bulk plasmon polariton (BPP) field with high spatial frequency can be achieved by combining with nano-scale gratings. Due to the large wave vector of the BPP illumination, the high-frequency information of the object can be transferred to the passband in traditional imaging systems and participate in super-resolution imaging. Illuminated by a BPP field with 2.66 k0 at a wavelength of 532 nm, a double-slit structure with a 100 nm-wide center-to-center distance has been resolved with a 0.85 numerical aperture standard objective based on this method. The lateral resolution is improved to λ/5.32. By further improving the transverse wave vector of BPP, it can be improved to λ/7.82. This design is label-free and conveniently integrated with traditional microscopes, which provides a visual super-resolution imaging method for applications in biomedicine, on-chip industry, material science, and other fields. -
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References
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Overview
The spatial resolution of traditional optical microscopy is limited by the diffraction limit λ/(2NA) (λ is the wavelength, NA is the numerical aperture of the objective lens of system), and the lateral resolution is about 200 nm~300 nm, which makes it difficult to achieve clear imaging for micro-nano structures or cell samples. In this paper, a label-free far-field super-resolution imaging method based on hyperbolic metamaterial is proposed. Super-resolution optical microscopy is an important technology due to the non-contact and non-destructive advantages. Currently, most of the super-resolution imaging methods rely on the fluorescent dyes, which limited their applications. The label-free far-field microscopy imaging method based on the frequency shift effect has been proposed and developed in recent years. However, its spatial resolution is limited by the refractive index of waveguide materials. Based on the characteristic of optical spatial spectrum band-pass filtering in hyperbolic metamaterials (HMM), a large-area uniform bulk plasmon polariton (BPP) field with high spatial frequency can be achieved by combining with nano-scale gratings. Due to the large wave vector of the BPP illumination, the high-frequency information of the object can be transferred to the passband in traditional imaging systems and participate in super-resolution imaging. Illuminated by a BPP field with 2.66k0 at the wavelength of 532 nm, a double-slits structure with a 100 nm-wide center-to-center distance has been resolved with a 0.85 numerical aperture standard objective based on this method. The lateral resolution is improved to λ/5.32. By further improving the transverse wave vector of BPP, it can be improved to λ/7.82. This design is label-free and conveniently integrated with traditional microscopes, which provides a visual super-resolution imaging method for applications in biomedicine, on-chip industry, material science, and other fields.
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Chen X S, Du W J, Lou Z L, et al. Label-free far-field subdiffraction imaging based on hyperbolic metamaterial[J]. Opto-Electron Eng, 2022, 49(11): 220056. doi: 10.12086/oee.2022.220056
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Figure 1.
Schematic diagram of frequency shift super-resolution imaging under BPP illumination. (a) Schematic diagram of fourier component detection range under conventional illumination，kc and k'c are transverse wave vectors of illuminating and scattered light, respectively, under conventional illumination; (b) Schematic diagram of fourier component detection range under BPP illumination, keva and k'eva are transverse wave vectors of illuminating and scattered light, respectively, under BPP illumination; (c) Extension of the highest detectable fourier component (from red solid line to green solid line), schematic diagram of frequency shift effect; (d) Schematic of BPP illumination
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Figure 2.
BPP structure. (a) Schematic of the BPP structure; (b) OTF of Ag/SiO2 multilayers in TM and TE polarization; (c) OTF for −1、0 and +1 orders; (d) The ratio of OTF for different diffraction orders
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Figure 3.
(a)~(c) The OTF of −1, 0, and +1 orders for for different kinc and kg, respectively; (d) The OTF of −1, 0, and +1 orders with 170 nm pitch grating at the incident angle of 18 degree
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Figure 4.
(a) The optical intensity distributions in the x–z plane when incidence angles are 18°, 46° and 60°, respectively; (b) The corresponding intensity decay curves away from the illumination surface in (a)
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Figure 5.
Far-field imaging simulation processes and results for double-slit structure with center-to center distance of 100 nm under BPP illumination with 2.66k0. (a) The intensity distribution in the x–z plane in FDTD method; (b) Far-field imaging intensity for double-slit structure; (c) Spatial spectrum of double-slit structures; (d) Spatial spectrum of scattered light for double-slit structures in the far field
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Figure 6.
(a) The contrast of far-field imaging for double-slit structure with different center-to-center distances illuminated by BPP; (b) The normalized optical intensity for double-slit structure with different center-to-center distances in far-field imaging
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Figure 7.
Super-resolution imaging under BPP illumination with transverse wave vector 3.86k0. (a) OTF of Ag/SiO2 multilayers in TM polarization; (b) OTF for −1、0 and +1 orders; (c) Far-field imaging intensity for double-slit structure
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